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企業(yè)文化愿景與使命

The company has been granted two national invention patents, marking a new peak in technological innovation

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The company has been granted two national invention patents, marking a new peak in technological innovation

The company has been granted two national invention patents, marking a new peak in technological innovation
2024-04-12

Recently, our company has been granted two national invention patents, namely "A large-sized LCD screen AOI automatic inspection machine" and "An intelligent detection device for wafer surface defects", with patent numbers of "202110019647.9" and "202210605392.9". The authorization of these two patents not only demonstrates the company's outstanding strength in the field of technological innovation, but also lays a solid foundation for the company to further expand its market and enhance its core competitiveness.

The invention of the patent "A large-sized LCD screen AOI automatic inspection machine" effectively solves the problems of low quality inspection efficiency and high manual inspection error rate in the production process of large-sized LCD screens. This device adopts advanced machine vision technology to achieve precise detection of LCD screens through high-speed image acquisition, processing, and analysis, greatly improving production efficiency and quality stability. This invention not only meets the market's demand for high-quality and high-efficiency detection of large-sized LCD screens, but also brings considerable economic benefits to the company.

The invention of another patent for an intelligent detection device for wafer surface defects is a major breakthrough in the field of wafer surface quality inspection in the semiconductor industry. This device uses deep learning algorithms and image recognition technology to achieve precise recognition and classification of small defects on the surface of wafers. This not only improves the accuracy and reliability of wafer quality inspection, but also provides strong support for the sustainable development of the semiconductor industry. The successful application of this invention will further consolidate the company's market position in the field of semiconductor testing equipment.

The authorization of these two patents is the result of the company's long-term commitment to technological innovation and research and development investment. The company always adheres to market demand orientation and technological innovation as its core competitiveness, continuously improving the technological content and added value of its products. At the same time, the company actively cooperates with universities, research institutions, and other organizations to strengthen the deep integration of industry, academia, and research, and promote the transformation of scientific and technological innovation achievements into productivity.

In the future, the company will continue to increase research and development investment, strengthen technological innovation and talent cultivation, continuously launch more high-tech products with independent intellectual property rights, and contribute to enhancing the overall level and international competitiveness of China's manufacturing industry. At the same time, the company will actively respond to the national innovation driven development strategy, lead enterprise development with technological innovation, and make unremitting efforts to achieve high-quality development goals.

The authorization of two national invention patents this time is not only a recognition of the company's technological innovation capability, but also an encouragement and impetus for the company's future development. The company will take this as an opportunity to continue to cultivate and improve its own strength and market competitiveness, and contribute more to promoting the transformation and upgrading of China's manufacturing industry and high-quality development.

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